This new facility for surface characterization is going to be installed soon. It has three techniques such as XPS, AES and UPS for elemental, compositional and valance and core level studies. The system has sample preparation chamber with in-situ fracturing facility.
The sample charges are yet not decided.
Multi technique surface characterization, Fully computerized analysis and surface quality control
Features:
- Fully computerized Surface Analysis
- Automatic quantification
- Nondestructive analysis
- Exact sample positioning & monitoring With following options
- Small spot ion source for depth profiling
- Optical microscope for sample monitoring
- Fine focus electron source for AES § UV-source for UPS
- X-Ray Monochromator
- Preparation chamber for surface processing
Applications
- Determination of layer thickness for hard disc production
- Control of wafer surface composition between different processing steps
- Composition analysis of bioactive surface
- Depth profiling of chemical concentration profiles with nm resolution
- Polymer surface composition checks following technological treatment
- General quality control in microelectronic production lines
- Adhesion problems on surfaces
- Chemical composition analysis
- Valance and core level studies
Contact Person: Dr. Mukesh Chander, Email: mukesh[at]physics.iitd.ac.in
